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Water Use and other Materials and Wastes Associated with Semiconductor Production

 One 6" wafer*  Intel Rio Rancho NM** 
(5000/week x 52 weeks) 
 Projected 120 new fabs*** 
(annually based on projection)
 
Input       
cu. ft. bulk gases  3,200 832,000,000(832 mil) 99,840,000,000(99.8 bil) 
cu ft. hazardous gases  22 5,720,000(5.72 mil) 6,864,000,000(686.4 bil) 
gals DI water  2,275 591,500,500(591 mil) 70,980,000,000(70.9 bil) 
lbs chemicals  20 5.200,000(5.2 mil) 624,000,000(624 mil) 
kW hrs electrical power  285 74,100,000(74.1 mil) 8,892,000,000(8.8 bil) 
        
        
Output       
lbs sodium hydroxide  25 6,500,000(6.5 mil) 780,000,000(780 mil) 
gals. waste water  2840 738,400,000 
(738 mil)
 88,608,000,000(88.6 bil) 
lbs hazardous waste  7 1,820,000(1.8 mil) 218,400,000(218.4 mil) 
        
        
* Based on calculations by Graydon Larabee of Texas Instruments, 1993     
** Projections made based on Intel data. The facility fabricates 8 inch wafers.       
*** Projections from Semiconductor International magazine, 1997       
        

 


Last Updated on 04/27/1999
By Silicon Valley Toxics Coalition.

 
Silicon Valley Toxics Coalition 760 N. First Street San Jose, CA 95112 Phone: +1 408-287-6707
Fax: +1 408-287-6771   e-mail: svtc@svtc.org

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